Coldstrip™

Uses water and oxygen to remove photoresist and other organic contaminants in producing semiconductors and flat panel displays. Coldstrip™ uses a gas diffuser and an ozone generator. This process cleans more quickly than many chemical-based processes as it produces no solids in the water (eliminating the need for filtration) and does not require elevated temperatures. Traditionally, Piranha solutions (containing sulfuric acid and hydrogen peroxide) are used to produce semiconductors and flat panel displays. These Piranha solutions are highly corrosive and have negative impacts on the environment. 

EPA Presidential Green Chemistry Challenge: 1997 Small Business Award